Title :
Nonlinear nanolayered polymers: ID photonic materials with applications to optical limiting
Author :
Shirk, J.S. ; Pong, R.G.S. ; Flom, S.R. ; Hiltner, A. ; Baer, E.
Author_Institution :
Div. of Opt. Sci., Naval Res. Lab., Washington, DC, USA
Abstract :
Summary form only given. New micro- and nano-layer polymeric materials have been fabricated by an extrusion method. The materials consist of up to many thousands of layers with a layer thickness down to 30 nm or smaller. The extrusion is a continuous process that yields polymeric photonic materials that are flexible sheets with large surface areas. We report nonlinear ID layered materials that were fabricated by dispersing nonlinear dyes in alternate layers. These new materials have a modulation in the complex nonlinear refractive index in the direction normal to the surface of the layers. There are several potential applications of these nanostructured materials including optical limiting.
Keywords :
dyes; extrusion; nanostructured materials; optical fabrication; optical limiters; optical polymers; photonic band gap; refractive index; ID photonic materials; alternate layers; complex nonlinear refractive index modulation; continuous process; extrusion method; flexible sheets; large surface areas; layer thickness; micro-layer polymeric materials; nano-layer polymeric materials; nonlinear ID layered materials; nonlinear dyes; nonlinear nanolayered polymers; optical limiting; polymeric photonic materials; Dielectric materials; Diode lasers; Nanostructured materials; Nonlinear optics; Optical films; Optical materials; Optical polymers; Optical refraction; Optical variables control; Sheet materials;
Conference_Titel :
Lasers and Electro-Optics, 2001. CLEO '01. Technical Digest. Summaries of papers presented at the Conference on
Conference_Location :
Baltimore, MD, USA
Print_ISBN :
1-55752-662-1
DOI :
10.1109/CLEO.2001.947504