DocumentCode :
3444079
Title :
Fluctuation limits & scaling opportunities for CMOS SRAM cells
Author :
Bhavnagarwala, Azeez ; Kosonocky, Stephen ; Radens, Carl ; Stawiasz, Kevin ; Mann, Randy ; Ye, Qiuyi ; Chin, Ken
Author_Institution :
IBM TJ Watson Res. Center, Yorktown Heights, NY
fYear :
2005
fDate :
5-5 Dec. 2005
Firstpage :
659
Lastpage :
662
Abstract :
Fundamental limitations on scaling CMOS SRAM cell transistor dimensions and operating voltages are demonstrated by measuring the local stochastic distributions of read, write and retention DC margins of 65nm PDSOI CMOS SRAM cells. DC measurements show, for the first time, the write operation to be more fluctuation limited. Measurements also reveal fundamental insights into terminal voltage dependencies of the fluctuations of cell storage node voltages - observations that are engaged to increase cell immunity to fluctuations by several orders of magnitude by biasing the cell terminal voltages appropriately
Keywords :
CMOS memory circuits; SRAM chips; silicon-on-insulator; stochastic processes; 65 nm; DC margins; DC measurements; PDSOI CMOS SRAM cells; data retention; fluctuation limits; local stochastic distributions; node voltages; read operation; write operation; CMOS technology; Fluctuations; Geometry; Grain size; Power measurement; Random access memory; Stochastic processes; Thickness measurement; Threshold voltage; Time measurement;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electron Devices Meeting, 2005. IEDM Technical Digest. IEEE International
Conference_Location :
Washington, DC
Print_ISBN :
0-7803-9268-X
Type :
conf
DOI :
10.1109/IEDM.2005.1609437
Filename :
1609437
Link To Document :
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