DocumentCode :
3446636
Title :
The application of a direct parameter extraction strategy to hot-carrier reliability simulation of n-channel LDD MOSFETs
Author :
Minehane, Seán ; Meehan, Alan ; Sullivan, Paula O. ; Mathewson, Alan ; Mason, Barry
Author_Institution :
Nat. Microelectron. Res. Centre, Cork, Ireland
fYear :
1996
fDate :
20-23 Oct 1996
Firstpage :
20
Lastpage :
26
Abstract :
The application of a direct parameter extraction technique to LDD n-channel MOSFET hot-carrier reliability simulation is presented in this paper. The use of direct extraction procedures allows a very fast extraction of circuit reliability parameters, with a minimum of measurements. This is an important consideration in relation to accelerated hot-carrier reliability testing, since it is highly desirable to minimise the duration of the interruptions to stressing conditions for the measurement of device characteristics. The parameters extracted are physically relevant, which is important when considering the physical nature of the hot-carrier degradation mechanisms. The more common commercial reliability simulators available in the industrial market, such as the BERT reliability simulator, generate predicted parameter sets after selected durations of device operation by extrapolation (or interpolation) between measured parameter sets extracted at intervals during a constant-bias stress. The work we are presenting suggests that confidence in the predicted circuit performance is dependent on very careful choice of both the parameter sets supplied to the reliability simulator, and the applied stressing conditions
Keywords :
MOSFET; digital simulation; electronic engineering computing; hot carriers; semiconductor device models; semiconductor device reliability; applied stressing conditions; circuit reliability parameters; constant-bias stress; direct parameter extraction strategy; hot-carrier reliability simulation; n-channel LDD MOSFETs; parameter sets; reliability simulator; Bit error rate; Circuit simulation; Circuit testing; Degradation; Hot carriers; Life estimation; MOSFET circuits; Parameter extraction; Predictive models; Stress measurement;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Integrated Reliability Workshop, 1996., IEEE International
Conference_Location :
Lake Tahoe, CA
Print_ISBN :
0-7803-3598-8
Type :
conf
DOI :
10.1109/IRWS.1996.583377
Filename :
583377
Link To Document :
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