Title :
Optimization of sidewall roughness in silica waveguides to reduce the propagation losses
Author :
Duk-Yong Choi ; Joo-Hoon Lee ; Sang-Wook Yoo ; Dong-Su Kim ; Young-Hoon Kim ; Sun-Tae Jung
Abstract :
Summary form only given. The propagation loss of silica waveguide is mainly due to the nonuniformities arising from the film deposition and etching process. Especially, scattering from the sidewall roughness (SWR) is the main cause of the propagation loss. Smooth sidewall offers lower propagation loss and reduced sensitivity to polarization. In this work SWR and etched profile of silica waveguides fabricated by dry etching were investigated. Fabrication techniques to form waveguides with vertical and smooth sidewall were suggested.
Keywords :
optical fabrication; optical losses; optical planar waveguides; scanning electron microscopy; silicon compounds; sputter etching; surface topography; SEM; SiO/sub 2/; dry etching; etch selectivity; etched profile; plasma induced surface damage; propagation losses reduction; sidewall roughness optimization; silica waveguides; silicon clamp; smooth sidewall; vertical sidewall; Chromium; Glass; Optical waveguides; Polymers; Propagation losses; Silicon compounds; Spectroscopy; Sputter etching; Ultrafast optics; Waveguide transitions;
Conference_Titel :
Lasers and Electro-Optics, 2001. CLEO '01. Technical Digest. Summaries of papers presented at the Conference on
Conference_Location :
Baltimore, MD, USA
Print_ISBN :
1-55752-662-1
DOI :
10.1109/CLEO.2001.947673