DocumentCode :
3447292
Title :
Forecasting field failure rate
Author :
May, J.T.
Author_Institution :
Dept. of Strategic Semicond. Technol., Medtronic Micro-Rel, Tempe, AZ
fYear :
1996
fDate :
20-23 Oct 1996
Firstpage :
170
Abstract :
An IC failure rate algorithm is presented which computes both average [2, p.34] and instantaneous failure rate based on the following user changeable parameters: gate oxide thickness; B-mode (extrinsic) gate oxide defect density, point-defect wafer yield; fault coverage; discovery distribution t50 and sigma; handling casualty rate, application temperature; gate oxide area, voltage and duty cycle for four different sections; die size; probe overvoltage stress time, voltage and duty cycle; burn-in type (static or dynamic), temperature, time, voltage, duty cycle, and post test efficiency for both point defects and for gross defects; IDDQ voltage and test limit, and coverage; and time in application
Keywords :
failure analysis; forecasting theory; integrated circuit reliability; IC failure rate algorithm; field failure rate forecasting; Application specific integrated circuits; Circuit testing; Dielectric breakdown; Integrated circuit reliability; Integrated circuit yield; Life estimation; Physics; Production; Reliability engineering; Solid state circuits;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Integrated Reliability Workshop, 1996., IEEE International
Conference_Location :
Lake Tahoe, CA
Print_ISBN :
0-7803-3598-8
Type :
conf
DOI :
10.1109/IRWS.1996.583409
Filename :
583409
Link To Document :
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