• DocumentCode
    3447975
  • Title

    Massive statistical process variations: A grand challenge for testing nanoelectronic circuits

  • Author

    Becker, B. ; Hellebrand, S. ; Polian, I. ; Straube, B. ; Vermeiren, W. ; Wunderlich, H.-J.

  • Author_Institution
    Univ. of Freiburg, Freiburg, Germany
  • fYear
    2010
  • fDate
    June 28 2010-July 1 2010
  • Firstpage
    95
  • Lastpage
    100
  • Abstract
    Increasing parameter variations, high defect densities and a growing susceptibility to external noise in nanoscale technologies have led to a paradigm shift in design. Classical design strategies based on worst-case or average assumptions have been replaced by statistical design, and new robust and variation tolerant architectures have been developed. At the same time testing has become extremely challenging, as parameter variations may lead to an unacceptable behavior or change the impact of defects. Furthermore, for robust designs a precise quality assessment is required particularly showing the remaining robustness in the presence of manufacturing defects. The paper pinpoints the key challenges for testing nanoelectronic circuits in more detail, covering the range of variation-aware fault modeling via methods for statistical testing and their algorithmic foundations to robustness analysis and quality binning.
  • Keywords
    integrated circuit manufacture; integrated circuit testing; nanoelectronics; quality management; external noise; manufacturing defects; massive statistical process variations; nanoelectronic circuits testing; nanoscale technologies; quality assessment; quality binning; robustness analysis; Automatic test pattern generation; Circuit faults; Circuit testing; Computational modeling; Delay; Libraries; Manufacturing; Noise robustness; Statistical analysis; System testing;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Dependable Systems and Networks Workshops (DSN-W), 2010 International Conference on
  • Conference_Location
    Chicago, IL
  • Print_ISBN
    978-1-4244-7729-6
  • Electronic_ISBN
    978-1-4244-7728-9
  • Type

    conf

  • DOI
    10.1109/DSNW.2010.5542612
  • Filename
    5542612