Title :
Massive statistical process variations: A grand challenge for testing nanoelectronic circuits
Author :
Becker, B. ; Hellebrand, S. ; Polian, I. ; Straube, B. ; Vermeiren, W. ; Wunderlich, H.-J.
Author_Institution :
Univ. of Freiburg, Freiburg, Germany
fDate :
June 28 2010-July 1 2010
Abstract :
Increasing parameter variations, high defect densities and a growing susceptibility to external noise in nanoscale technologies have led to a paradigm shift in design. Classical design strategies based on worst-case or average assumptions have been replaced by statistical design, and new robust and variation tolerant architectures have been developed. At the same time testing has become extremely challenging, as parameter variations may lead to an unacceptable behavior or change the impact of defects. Furthermore, for robust designs a precise quality assessment is required particularly showing the remaining robustness in the presence of manufacturing defects. The paper pinpoints the key challenges for testing nanoelectronic circuits in more detail, covering the range of variation-aware fault modeling via methods for statistical testing and their algorithmic foundations to robustness analysis and quality binning.
Keywords :
integrated circuit manufacture; integrated circuit testing; nanoelectronics; quality management; external noise; manufacturing defects; massive statistical process variations; nanoelectronic circuits testing; nanoscale technologies; quality assessment; quality binning; robustness analysis; Automatic test pattern generation; Circuit faults; Circuit testing; Computational modeling; Delay; Libraries; Manufacturing; Noise robustness; Statistical analysis; System testing;
Conference_Titel :
Dependable Systems and Networks Workshops (DSN-W), 2010 International Conference on
Conference_Location :
Chicago, IL
Print_ISBN :
978-1-4244-7729-6
Electronic_ISBN :
978-1-4244-7728-9
DOI :
10.1109/DSNW.2010.5542612