Title :
Fabrication of nanostructures with interferometric lithography
Author :
Burckel, D. ; Shuang Zhang ; Brueck, Steven R. J.
Author_Institution :
Center for High Technol. Mater., Albuquerque, NM, USA
Abstract :
Summary form only given. Nanostructures, features with characteristic dimensions between 1- and 100-nm, are the focus of much current attention as a result of the unique physical properties offered in this mesoscopic regime. As semiconductor-processing technology has matured, the ability to create small structures has improved. Traditional nanostructure fabrication involves serial processing, e.g. e-beam lithography. For many applications, such as heterostructure crystal growth, a large-area parallel processing capability is vital. One optical lithography technique, interferometric lithography (IL), is a powerful technique for making nanostructures, providing an inexpensive method to generate nano-scale features over large areas.
Keywords :
diffraction gratings; light interferometry; nanotechnology; optical fabrication; photolithography; semiconductor technology; 1 to 100 nm; electron beam lithography; fabrication; heterostructure crystal growth; interferometric lithography; large areas; large-area parallel processing capability; mesoscopic regime; nano-scale features; nanostructure fabrication; nanostructures; optical lithography technique; physical properties; semiconductor-processing technology; serial processing; Equations; Fabrication; Frequency; Gratings; Interferometric lithography; Lighting; Nanostructured materials; Optical interferometry; Semiconductor nanostructures; Silicon;
Conference_Titel :
Lasers and Electro-Optics, 2001. CLEO '01. Technical Digest. Summaries of papers presented at the Conference on
Conference_Location :
Baltimore, MD, USA
Print_ISBN :
1-55752-662-1
DOI :
10.1109/CLEO.2001.947740