Title :
Sensitive surface cleaning by means of an excimer laser scanning device
Author :
Steglich, K.-H. ; Harde, H.
Author_Institution :
Fachbereich Elektrotechnik, Bundeswehr Hamburg, Germany
Abstract :
Summary form only given. We present a device developed for cleaning of superficial adherent impurities by removal of only thin films of a surface layer. This cleaning is of interest for a multitude of objects in industry or arts. Basically the intention is the removal of contaminations consisting of dust and environmental impacts which are deposited on the surface and thus restrain or prohibit the usage of such devices. Typical examples are the cleaning of layers in the computer chip production, monument and painting maintenance and restoration or the cleaning of radioactively contaminated surfaces consisting of varnish. In all these cases only thin films in depth will be treated or removed. A destruction or replacement of the top layer or the underlying.
Keywords :
excimer lasers; fission reactor decommissioning; laser beam etching; optical scanners; semiconductor technology; surface cleaning; surface contamination; arts; computer chip production; contamination removal; excimer laser scanning device; industry; monument maintenance; painting; radioactively contaminated surface cleaning; sensitive surface cleaning; superficial adherent impurities; surface layer; Art; Image restoration; Impurities; Painting; Production; Surface cleaning; Surface contamination; Surface emitting lasers; Surface treatment; Thin film devices;
Conference_Titel :
Lasers and Electro-Optics, 2001. CLEO '01. Technical Digest. Summaries of papers presented at the Conference on
Conference_Location :
Baltimore, MD, USA
Print_ISBN :
1-55752-662-1
DOI :
10.1109/CLEO.2001.947746
