DocumentCode
344904
Title
Energy resolution at interaction point for asymmetric beams
Author
Petracca, S. ; Hirata, K.
Author_Institution
KEK, Tsukuba, Japan
Volume
3
fYear
1999
fDate
1999
Firstpage
1689
Abstract
The monochromatic scheme adopted in the tau-charm factories uses a large dispersion at interaction point to obtain a very high collision energy resolution. Due to the presence of dispersion, however, the beam-beam interaction induces the synchro-betatron coupling. Even if in the linear regime, it can lead to potentially serious effects. One of the most serious is the rapid decrease of the energy resolution when the beam-beam parameter increases, even if the motion is stable. In this paper we study this effect in detail either for symmetric and asymmetric beams and give formula for the energy resolution
Keywords
electron accelerators; particle beam stability; asymmetric beams; beam-beam interaction; beam-beam parameter; energy resolution; interaction point; monochromatic scheme; synchro-betatron coupling; tau-charm factories; Dispersion; Distribution functions; Electrochemical machining; Electrooptic effects; Energy resolution; Linear particle accelerator; Optical coupling; Particle beams; Production facilities; Synchrotrons;
fLanguage
English
Publisher
ieee
Conference_Titel
Particle Accelerator Conference, 1999. Proceedings of the 1999
Conference_Location
New York, NY
Print_ISBN
0-7803-5573-3
Type
conf
DOI
10.1109/PAC.1999.794223
Filename
794223
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