• DocumentCode
    3449738
  • Title

    Monitoring for parts-per-billion trace gas impurity contamination in semiconductor fab process gases

  • Author

    Wen-Bin Yan

  • Author_Institution
    MEECO, Inc., Warrington, PA, USA
  • fYear
    2001
  • fDate
    11-11 May 2001
  • Firstpage
    288
  • Abstract
    Summary form only given. A major innovation in trace gas impurity contamination monitoring has led to the development of a complete analyzer system, the MTO-1000, for continuous detection of ultra low trace gas impurities in semiconductor process gases. The analyzer is based on infrared laser absorption spectroscopy. It provides 500 part\´s per trillion (PPT) sensitivity for moisture, and PPB or sub-PPB for other trace gas impurities. Moisture is a major contaminant that originates from the atmosphere and causes severe damage to UHP piping and semiconductor wafers. The principle of operation of the MTO-1000 is cavity ring-down spectroscopy (CRDS), which was jointly developed by MEECO and Princeton University. The availability of an inexpensive diode laser that can be operated in various parts of the infrared spectrum is part of the new trace gas analyzer. Conventional infrared limitations to measuring low PPB concentrations are amplitude noise of light sources and the detector. There are no such limitations with CRDS since it measures the time it takes for the signal to "ring down" or decrease in amplitude.
  • Keywords
    chemical variables measurement; infrared spectroscopy; moisture measurement; monitoring; semiconductor technology; sensitivity; spectrochemical analysis; MEECO; MTO-1000; Princeton University; UHP piping; atmosphere; cavity ring-down spectroscopy; complete analyzer system; continuous detection; inexpensive diode laser; infrared laser absorption spectroscopy; infrared limitations; infrared spectrum; moisture; monitoring; semiconductor fab process gases; semiconductor process gases; semiconductor wafers; sensitivity; severe damage; trace gas analyzer; trace gas impuirities; trace gas impurity contamination; trace gas impurity contamination monitoring; ultra low trace gas impurities; Contamination; Gases; Infrared detectors; Infrared spectra; Moisture; Monitoring; Pollution measurement; Semiconductor impurities; Spectroscopy; Technological innovation;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Lasers and Electro-Optics, 2001. CLEO '01. Technical Digest. Summaries of papers presented at the Conference on
  • Conference_Location
    Baltimore, MD, USA
  • Print_ISBN
    1-55752-662-1
  • Type

    conf

  • DOI
    10.1109/CLEO.2001.947813
  • Filename
    947813