DocumentCode :
3450622
Title :
Sub-100 μm2 PNP load cell for sub-ns/25 kbit ECL RAM
Author :
Morikawa, T. ; Tashiro, T.
Author_Institution :
NEC Corp., Kanagawa, Japan
fYear :
1991
fDate :
9-10 Sep 1991
Firstpage :
146
Lastpage :
149
Abstract :
The potential of sub-100 μm2 PNP load cells for sub-ns/256 kb ECL (emitter coupled logic) RAM have been studied. Soft-error immunity and write switching operation are investigated with several kinds of cell structures. By using a novel cell structure with a p+ overlap diffusion layer in the p- substrate of the cell area, the collected charge in the collector node of the memory cell, which is responsible for soft-error in circuit operation, was reduced by 30% in comparison to the conventional structure. To evaluate cell soft-error immunity, a novel method of cell storage charge calculation taking account of diffusion capacitances is proposed. For high-seed write switching operation, by utilizing the novel trench isolation structure which is partially inserted into the active region of the memory cell, a 50% decrease in the minimum write pulse width compared with the conventional structure was simulated. By using the optimized 86 μm2 PNP load cell, which has the two novel cell structures mentioned above, a simulated address access time of 0.8 ns was achieved for a 256 kbit ECL RAM
Keywords :
VLSI; emitter-coupled logic; integrated circuit technology; integrated memory circuits; random-access storage; 0.8 ns; 256 kbit; ECL RAM; PNP load cell; address access time; cell area; cell storage charge calculation; cell structures; diffusion capacitances; emitter coupled logic; high-seed write; high-speed digital circuits; memory cell; p+ overlap diffusion layer; p- substrate; soft-error immunity; trench isolation structure; write pulse width; write switching operation; Circuit simulation; Design optimization; Electrons; Isolation technology; National electric code; Parasitic capacitance; Random access memory; Read-write memory; Space vector pulse width modulation; Very large scale integration;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Bipolar Circuits and Technology Meeting, 1991., Proceedings of the 1991
Conference_Location :
Minneapolis, MN
Print_ISBN :
0-7803-0103-X
Type :
conf
DOI :
10.1109/BIPOL.1991.160974
Filename :
160974
Link To Document :
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