Title :
Microstrip filters on high resistivity Si substrate
Author :
Pan, Wu ; Wu, Shou-Zhatig ; Li, Ying-Liang ; Chen, Yan
Author_Institution :
Inst. of MOEMS, Chongqing Univ. of Posts & Telecommun., China
Abstract :
A model of microstrip filter based Si micromachining structure is presented and its performance parameters are analyzed. The design optimization of the microstrip filter is fulfilled by electromagnetic simulation software. The filter has a volume of 2.0 mm × 0.85 mm × 0.12 mm. Its center frequency is 40 GHz, transmission band is estimated at 12 GHz, and return loss is smaller than 4 dB. The simulated results indicate that the filters have good performance.
Keywords :
computational electromagnetics; electrical resistivity; micromachining; microstrip filters; optimisation; silicon; 12 GHz; 40 GHz; design optimization; electromagnetic simulation software; high resistivity Si substrate; micromachining structure; microstrip filters; performance; performance parameters; Band pass filters; Conductivity; Conductors; Dielectric constant; Dielectric losses; Micromachining; Microstrip filters; Propagation losses; Rough surfaces; Surface roughness;
Conference_Titel :
Computational Electromagnetics and Its Applications, 2004. Proceedings. ICCEA 2004. 2004 3rd International Conference on
Print_ISBN :
0-7803-8562-4
DOI :
10.1109/ICCEA.2004.1459400
