Extreme ultraviolet emission from Xe clusters excited by high intensity lasers [for lithography]

Author

Mori, Marco ; Shiraishi, Tomohiro ; Kondo, K. ; Nabekawa, Yasuo ; Sekikawa, T. ; Watanabe, Shigetaka

Author_Institution

Centerfor Tsukuba Adv. Res. Alliance, Tsukuba Univ., Ibaraki, Japan

fYear

2001

fDate

11-11 May 2001

Firstpage

337

Abstract

Summary form only given. The property of EUV generation from Xe clusters irradiated with intense lasers was studied. The irradiation conditions were changed with using various laser systems. The wavelength, the pulse width, and the pump energy were widely changed. Xe cluster jet was generated with a supersonic gas jet. Typically, the average number density was measured to be 5 /spl times/ 10/sup 18/ cm/sup -3/ with the backing pressure of 7 atm. The EUV spectrum was obtained with a transmission grating spectrometer. As a result, the highest conversion efficiency can be obtained with a subpicosecond KrF laser pulse in the low density Xe cluster jet. This EUV source is thought to be a debris free source. Then it is attractive for the application to the EUV lithography. Recently, a subpicosecond KrF laser system of 50 W in average power was developed. If we use this system, 5 W EUV source can be obtained with a debris free condition.

Keywords

atomic clusters; light sources; optical pumping; plasma jets; plasma production by laser; ultraviolet lithography; xenon; 5 W; 7 atm; EUV lithography; Xe; conversion efficiencies; debris free source; extreme ultraviolet emission; high intensity laser excited clusters; nanosecond irradiation; pulse width; pump energy; subpicosecond irradiation; supersonic gas jet; under dense plasma; Density measurement; Gas lasers; Gratings; Laser excitation; Laser transitions; Pressure measurement; Pump lasers; Space vector pulse width modulation; Ultraviolet sources; Wavelength measurement;

fLanguage

English

Publisher

ieee

Conference_Titel

Lasers and Electro-Optics, 2001. CLEO '01. Technical Digest. Summaries of papers presented at the Conference on

Conference_Location

Baltimore, MD, USA

Print_ISBN

1-55752-662-1

Type

conf

DOI

10.1109/CLEO.2001.947882

Filename

947882