Title :
The dynamic response of the semiconductor tunneling structures: effect of tunneling junction plasmons
Author :
Volkov, V.A. ; Feiginov, M.N.
Author_Institution :
Inst. of Radio Eng. & Electron., Acad. of Sci., Moscow, Russia
Abstract :
We have considered the dynamic response of the structures of the following type: metal-semiconductor-tunneling junction-semiconductor-metal in the hydrodynamic approximation and with account of electromagnetic retardation. It was shown that the high-frequency impedance of the structure has a multiresonance character when the skin layer depth is less than the semiconductor dimensions. This phenomenon is concerned with excitation of low-frequency branch of tunneling junction plasmons (TJPs) by the inhomogeneous current flowing along the semiconductor lateral surface. The impedance has the resonances when the structure width is the TJP half-wavelength multiple. The resonances can become self-exciting in the negative differential tunnel conductance regime of the resonant tunneling diode
Keywords :
negative resistance; plasmons; resonant tunnelling diodes; semiconductor junctions; semiconductor plasma; skin effect; tunnelling; dynamic response; electromagnetic retardation; high-frequency impedance; hydrodynamic approximation; metal-semiconductor-tunneling junction-semiconductor-metal structure; multiresonance; negative differential conductance; resonant tunneling diode; self-exciting resonances; skin layer; tunneling junction plasmons; Conductors; Frequency; Maxwell equations; Plasma displays; Plasma waves; Plasmons; Resonance; Resonant tunneling devices; Skin; Surface impedance;
Conference_Titel :
Physics and Computer Modeling of Devices Based on Low-Dimensional Structures, 1995. Proceedings., International Workshop on
Conference_Location :
Aizu-Wakamatsu
Print_ISBN :
0-8186-7321-4
DOI :
10.1109/PCMDLS.1995.494961