DocumentCode
3451759
Title
Nano devices for the future IT
Author
Fukuma, M.
fYear
2004
fDate
26-29 Oct. 2004
Firstpage
2
Lastpage
2
Abstract
Summary form only given. Up to now, silicon LSls have been developed based on?? the so called scaling principle, and established huge market in the IT business. However, due to physical and practical limitations, introduction of new architectures and new materials, i.e. the post scaling technology, is a must for the further progress in future LSI performance, in addition to the device miniaturization.
Keywords
CMOS technology; FETs; High K dielectric materials; High-K gate dielectrics; Large scale integration; Nanostructured materials; National electric code; Quantum computing; Silicon; Switches;
fLanguage
English
Publisher
ieee
Conference_Titel
Microprocesses and Nanotechnology Conference, 2004. Digest of Papers. 2004 International
Conference_Location
Osaka, Japan
Print_ISBN
4-99024720-5
Type
conf
DOI
10.1109/IMNC.2004.245690
Filename
1459440
Link To Document