DocumentCode :
3451888
Title :
Development of amorphous polyphenol resists with low molecular weight and narrow dispersion for EB lithography
Author :
Hirayama, Takatsugu ; Shiono, Daiju ; Matsumaru, Shogo ; Ogata, Toshiyuki ; Hada, Hideo ; Onodera, Junichi ; Arai, Tadashi ; Sakamizu, Toshio ; Yamaguchi, Atsuko ; Shirai, Hiroshi ; Fukuda, Hiroshi ; Ueda, Mitsuru
fYear :
2004
fDate :
Oct. 27-29, 2004
Firstpage :
10
Lastpage :
11
Keywords :
Amorphous semiconductors; Circuits; Large scale integration; Lithography; Organic materials; Polymers; Protection; Resists; Rough surfaces; Surface roughness;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microprocesses and Nanotechnology Conference, 2004. Digest of Papers. 2004 International
Print_ISBN :
4-99024720-5
Type :
conf
DOI :
10.1109/IMNC.2004.245696
Filename :
1459446
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=3451888
