Title :
Evaluation of the performance of proximity effect correction in electron-projection lithography
Author :
Osawa, Masato ; Ogino, Koji ; Hoshino, Hiroaki ; Machida, Yoshinobu
Keywords :
Backscatter; Controllability; Energy resolution; Lead compounds; Lithography; Page description languages; Proximity effect; Resists; Scattering; Shape;
Conference_Titel :
Microprocesses and Nanotechnology Conference, 2004. Digest of Papers. 2004 International
Print_ISBN :
4-99024720-5
DOI :
10.1109/IMNC.2004.245697
