DocumentCode
3451905
Title
Evaluation of the performance of proximity effect correction in electron-projection lithography
Author
Osawa, Masato ; Ogino, Koji ; Hoshino, Hiroaki ; Machida, Yoshinobu
fYear
2004
fDate
Oct. 27-29, 2004
Firstpage
12
Lastpage
13
Keywords
Backscatter; Controllability; Energy resolution; Lead compounds; Lithography; Page description languages; Proximity effect; Resists; Scattering; Shape;
fLanguage
English
Publisher
ieee
Conference_Titel
Microprocesses and Nanotechnology Conference, 2004. Digest of Papers. 2004 International
Print_ISBN
4-99024720-5
Type
conf
DOI
10.1109/IMNC.2004.245697
Filename
1459447
Link To Document