DocumentCode :
3451934
Title :
Euv system optimization and advanced lithography research at Lawrence Berkeley National Laboratory
Author :
Goldberg, Kenneth A. ; Naulleau, Patrick P. ; Denham, Paul E. ; Rekawa, Senajith B. ; Jackson, Keith H. ; Anderson, Erik H. ; Liddle, J.Alexander
fYear :
2004
fDate :
Oct. 27-29, 2004
Firstpage :
14
Lastpage :
15
Keywords :
Focusing; Interferometric lithography; Laboratories; Lighting; Optical feedback; Optical interferometry; Printing; Resists; System testing; Ultraviolet sources;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microprocesses and Nanotechnology Conference, 2004. Digest of Papers. 2004 International
Print_ISBN :
4-99024720-5
Type :
conf
DOI :
10.1109/IMNC.2004.245698
Filename :
1459448
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=3451934
