DocumentCode :
3451962
Title :
Mask pattern correction by energy loss compensation in extreme ultraviolet lithography
Author :
Sugawara, Minoru ; Nishiyama, Iwao ; Takai, Mikio
fYear :
2004
fDate :
Oct. 27-29, 2004
Firstpage :
16
Lastpage :
17
Keywords :
Degradation; Diffraction; Energy loss; Laboratories; Lithography; Materials science and technology; Optical films; Optical reflection; Research and development; Ultraviolet sources;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microprocesses and Nanotechnology Conference, 2004. Digest of Papers. 2004 International
Print_ISBN :
4-99024720-5
Type :
conf
DOI :
10.1109/IMNC.2004.245699
Filename :
1459449
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=3451962
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