DocumentCode
3451996
Title
Particle adhesion and removal on EUV mask layers during wet cleaning
Author
Lee, Sang-Ho ; Park, Jin-Goo ; Busn, A.A.
fYear
2004
fDate
Oct. 27-29, 2004
Firstpage
18
Lastpage
19
Keywords
Adhesives; Buffer layers; Chemical technology; Chromium; Cleaning; Electrostatics; Force measurement; Lithography; Silicon compounds; Surface contamination;
fLanguage
English
Publisher
ieee
Conference_Titel
Microprocesses and Nanotechnology Conference, 2004. Digest of Papers. 2004 International
Print_ISBN
4-99024720-5
Type
conf
DOI
10.1109/IMNC.2004.245700
Filename
1459450
Link To Document