Hybrid organic-inorganic films fabricated using atomic and molecular layer deposition

Atomic layer deposition (ALD) and molecular layer deposition (MLD) are based on sequential, self-limiting surface reactions that produce atomic layer controlled and conformal thin film growth. ALD can deposit inorganic films and MLD can deposit films containing organics. ALD and MLD can be used together to fabricate a wide range of flexible hybrid organic-inorganic films. The tunable mechanical properties of alucone alloys grown using Al₂O₃ ALD and alucone MLD may be useful as flexible barrier films. The tunable electrical conductivity of zincone alloys grown using ZnO ALD and zincone MLD may be useful as flexible transparent conducting films. These hybrid organic-inorganic films could have many applications for flexible sensors and actuators.