3452158

Intrinsic problem affecting contact hole resolution in hyper NA era

Matsuura, Seiji ; Kurose, Eiji ; Fuji, Kiyoshi

2004

Oct. 27-29, 2004

36

37

Apertures; Interferometric lithography; Lead compounds; Lighting; Open wireless architecture; Optical control; Optical interferometry; Optical polarization; Space technology; Ultraviolet sources;

English

ieee

Microprocesses and Nanotechnology Conference, 2004. Digest of Papers. 2004 International

4-99024720-5

conf

10.1109/IMNC.2004.245709

1459459