DocumentCode :
3452647
Title :
Patterning SiO
2
layer using molecular transfer lithography (MxL)
Author :
Hatogai, Tetsuhiro ; Schaper, Charles D. ; Fabian, R. ; Pease, W.
fYear :
2004
fDate :
Oct. 27-29, 2004
Firstpage :
72
Lastpage :
73
Keywords :
Etching; Lithography; Resists; Shape; Silicon;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microprocesses and Nanotechnology Conference, 2004. Digest of Papers. 2004 International
Print_ISBN :
4-99024720-5
Type :
conf
DOI :
10.1109/IMNC.2004.245728
Filename :
1459478
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=3452647
