Title :
Thermal fixing of volume holograms in Fe:LiNbO/sub 3/ crystals
Author :
Shiuan Huei Lin ; Mei Li Hsieh ; Chao Ray Hsieh ; Tai Chiung Hsieh ; Hsu, K.Y. ; Chiou, A.
Author_Institution :
Inst. of Electro-Opt. Eng., Nat. Chiao Tung Univ., Hsinchu, Taiwan
fDate :
Aug. 30 1999-Sept. 3 1999
Abstract :
We adapt a model proposed by Yariv to analyze the two recording procedures via the kinetics of the recording, fixing, and developing processes under either short circuit or preexposed open-circuit boundary condition. From the analysis, we deduce the optimal condition (in terms of the fixing temperature and the compensation time) for each procedure. The results provide useful guides to design thermal fixing procedures for reaching the maximum fixing efficiency.
Keywords :
compensation; holography; iron; lithium compounds; photorefractive materials; Fe:LiNbO/sub 3/ crystals; LiNbO/sub 3/:Fe; compensation time; fixing temperature; kinetics; maximum fixing efficiency; optimal condition; preexposed open-circuit boundary condition; recording procedures; thermal fixing; thermal fixing procedures; volume hologram; Electrons; Gratings; Heating; Lighting; Nonvolatile memory; Optical recording; Particle beams; Protons; Temperature dependence; Thermal conductivity;
Conference_Titel :
Lasers and Electro-Optics, 1999. CLEO/Pacific Rim '99. The Pacific Rim Conference on
Conference_Location :
Seoul, South Korea
Print_ISBN :
0-7803-5661-6
DOI :
10.1109/CLEOPR.1999.814758
