Thermal fixing of volume holograms in Fe:LiNbO/sub 3/ crystals

Author

Shiuan Huei Lin ; Mei Li Hsieh ; Chao Ray Hsieh ; Tai Chiung Hsieh ; Hsu, K.Y. ; Chiou, A.

Author_Institution

Inst. of Electro-Opt. Eng., Nat. Chiao Tung Univ., Hsinchu, Taiwan

Volume

4

fYear

1999

fDate

Aug. 30 1999-Sept. 3 1999

Firstpage

1247

Abstract

We adapt a model proposed by Yariv to analyze the two recording procedures via the kinetics of the recording, fixing, and developing processes under either short circuit or preexposed open-circuit boundary condition. From the analysis, we deduce the optimal condition (in terms of the fixing temperature and the compensation time) for each procedure. The results provide useful guides to design thermal fixing procedures for reaching the maximum fixing efficiency.

Keywords

compensation; holography; iron; lithium compounds; photorefractive materials; Fe:LiNbO/sub 3/ crystals; LiNbO/sub 3/:Fe; compensation time; fixing temperature; kinetics; maximum fixing efficiency; optimal condition; preexposed open-circuit boundary condition; recording procedures; thermal fixing; thermal fixing procedures; volume hologram; Electrons; Gratings; Heating; Lighting; Nonvolatile memory; Optical recording; Particle beams; Protons; Temperature dependence; Thermal conductivity;

fLanguage

English

Publisher

ieee

Conference_Titel

Lasers and Electro-Optics, 1999. CLEO/Pacific Rim '99. The Pacific Rim Conference on

Conference_Location

Seoul, South Korea

Print_ISBN

0-7803-5661-6

Type

conf

DOI

10.1109/CLEOPR.1999.814758

Filename

814758