Title :
Optical near-field photolithography by a novel super-resolution near-field structure employing diarylethene
Author :
Ohta, Takayuki ; Nakamura, Kei-Ichi ; Ito, Masafumi
Keywords :
Apertures; High speed optical techniques; Indium; Lithography; Optical device fabrication; Optical sensors; Photochromism; Protection; Resists; Substrates;
Conference_Titel :
Microprocesses and Nanotechnology Conference, 2004. Digest of Papers. 2004 International
Print_ISBN :
4-99024720-5
DOI :
10.1109/IMNC.2004.245737
