DocumentCode :
3452979
Title :
Experiment of EUV mirror contamination with use of undulator radiation
Author :
Niibe, M. ; Kakutani, Yuji ; Kakiuchi, Kazuya ; Terashima, Shigeru ; Takase, Hiromitsu ; Gomei, Yoshio ; Aoki, Takashi ; Mtsunari, Shuichi ; Kondo, Hiroyuki ; Fukuda, Yasuaki
fYear :
2004
fDate :
Oct. 27-29, 2004
Firstpage :
96
Lastpage :
97
Keywords :
Contamination; Laboratories; Life estimation; Life testing; Lithography; Mirrors; Pollution measurement; Reflectivity; Ultraviolet sources; Undulators;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microprocesses and Nanotechnology Conference, 2004. Digest of Papers. 2004 International
Print_ISBN :
4-99024720-5
Type :
conf
DOI :
10.1109/IMNC.2004.245741
Filename :
1459491
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=3452979
