DocumentCode :
3453384
Title :
Nanoimprint lithography using hydrogen silsequioxane(HSQ) mold
Author :
Kawamori, Masanori ; Nakamatsu, Ken-ichiro ; Tone, Katsuhiko ; Katase, Tetsuya ; Namatsu, Hideo ; Matsui, Shinji
fYear :
2004
fDate :
Oct. 27-29, 2004
Firstpage :
124
Lastpage :
125
Keywords :
Embossing; Hydrogen; Lithography; Nanolithography; Nanoscale devices; Resists; Scanning electron microscopy; Shape; Substrates; Temperature dependence;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microprocesses and Nanotechnology Conference, 2004. Digest of Papers. 2004 International
Print_ISBN :
4-99024720-5
Type :
conf
DOI :
10.1109/IMNC.2004.245755
Filename :
1459505
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=3453384
