DocumentCode
3453384
Title
Nanoimprint lithography using hydrogen silsequioxane(HSQ) mold
Author
Kawamori, Masanori ; Nakamatsu, Ken-ichiro ; Tone, Katsuhiko ; Katase, Tetsuya ; Namatsu, Hideo ; Matsui, Shinji
fYear
2004
fDate
Oct. 27-29, 2004
Firstpage
124
Lastpage
125
Keywords
Embossing; Hydrogen; Lithography; Nanolithography; Nanoscale devices; Resists; Scanning electron microscopy; Shape; Substrates; Temperature dependence;
fLanguage
English
Publisher
ieee
Conference_Titel
Microprocesses and Nanotechnology Conference, 2004. Digest of Papers. 2004 International
Print_ISBN
4-99024720-5
Type
conf
DOI
10.1109/IMNC.2004.245755
Filename
1459505
Link To Document