DocumentCode :
3453405
Title :
Nanoimprint lithography for high aspect ratio patterns
Author :
Konishi, Takaaki ; Kanakugi, Tomohiro ; Toyota, Hiroshi ; Kawata, Hirotaka ; Hirai, Yoshihiko
fYear :
2004
fDate :
Oct. 27-29, 2004
Firstpage :
126
Lastpage :
127
Keywords :
High speed optical techniques; Lenses; Nanolithography; Optical device fabrication; Optical polymers; Optical retarders; Optical switches; Resists; Stress; Surface treatment;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microprocesses and Nanotechnology Conference, 2004. Digest of Papers. 2004 International
Print_ISBN :
4-99024720-5
Type :
conf
DOI :
10.1109/IMNC.2004.245756
Filename :
1459506
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=3453405
