DocumentCode :
3453465
Title :
Study on polymer deformation for novel cross-sectional patterns in nanoimprint lithography
Author :
Kanakugi, K. ; Konishi, T. ; Kawata, H. ; Hirai, Y.
fYear :
2004
fDate :
Oct. 27-29, 2004
Firstpage :
130
Lastpage :
131
Keywords :
Deformable models; Filling; Nanolithography; Nanoscale devices; Optical device fabrication; Optical devices; Optical diffraction; Optical polymers; Rubber; Semiconductor devices;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microprocesses and Nanotechnology Conference, 2004. Digest of Papers. 2004 International
Print_ISBN :
4-99024720-5
Type :
conf
DOI :
10.1109/IMNC.2004.245758
Filename :
1459508
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=3453465
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