Title :
In-situ resist temperature monitor during hot embossing lithography by fluorescence probe technique
Author :
Fu-Hsiang Ko ; Hwang ; Mei-fen Chen ; Weng, Li-Yu ; Chu-Jung Ko ; Hsuen-Li Chen
Keywords :
Embossing; Fluorescence; Heating; Lithography; Polymers; Probes; Rapid thermal processing; Resists; Temperature measurement; Temperature sensors;
Conference_Titel :
Microprocesses and Nanotechnology Conference, 2004. Digest of Papers. 2004 International
Print_ISBN :
4-99024720-5
DOI :
10.1109/IMNC.2004.245761
