In-situ resist temperature monitor during hot embossing lithography by fluorescence probe technique

Author

Fu-Hsiang Ko ; Hwang ; Mei-fen Chen ; Weng, Li-Yu ; Chu-Jung Ko ; Hsuen-Li Chen

fYear

2004

fDate

Oct. 27-29, 2004

Firstpage

136

Lastpage

137

Keywords

Embossing; Fluorescence; Heating; Lithography; Polymers; Probes; Rapid thermal processing; Resists; Temperature measurement; Temperature sensors;

fLanguage

English

Publisher

ieee

Conference_Titel

Microprocesses and Nanotechnology Conference, 2004. Digest of Papers. 2004 International

Print_ISBN

4-99024720-5

Type

DOI

10.1109/IMNC.2004.245761

Filename

1459511

Link To Document