DocumentCode :
3453617
Title :
Contactless testing using EB techniques: an important support to the debug of modern VLSI
Author :
Sartori, M.
Author_Institution :
COREP-LETEO, Torino, Italy
fYear :
1995
fDate :
11-14 Oct 1995
Firstpage :
545
Lastpage :
555
Abstract :
EB (electron beam) testing can be a very useful aid to designers of complex VLSI components. The reasons why contactless testing has become so popular are presented in this paper from a designer point of view. The link with DFT (Design for Testability) is demonstrated with the possibility of improving the global observability of the whole chip. After a brief introduction, the basic theory of SEM in the voltage contrast mode is presented and the traditional EBT techniques are explained. The most advanced features available in modern EBT equipment are also described with their interaction with the design and testing environments
Keywords :
VLSI; design for testability; electron beam testing; integrated circuit testing; scanning electron microscopes; DFT; EB testing; SEM; VLSI components; contactless testing; electron beam testing; global observability; voltage contrast mode; Cathode ray tubes; Circuit testing; Debugging; Electron beams; Integrated circuit testing; Lenses; Pins; Scanning electron microscopy; Very large scale integration; Voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Semiconductor Conference, 1995. CAS'95 Proceedings., 1995 International
Conference_Location :
Sinaia
Print_ISBN :
0-7803-2647-4
Type :
conf
DOI :
10.1109/SMICND.1995.495077
Filename :
495077
Link To Document :
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