Simulation of low-energy ion implantation process by atomistic modeling
Author :
Kwon, Oh-Seob ; Seo, Ji-Hyun ; Yoo, Jae-Hyun ; Kim, Ki-Dong ; Lee, Jun-Gu ; Park, Il-Soo ; Won, Tae-young
fYear :
2004
fDate :
Oct. 27-29, 2004
Firstpage :
148
Lastpage :
149
Keywords :
Annealing; Computational modeling; Impurities; Ion implantation; Kinetic theory; Monte Carlo methods; Nanoscale devices; Semiconductor process modeling; Silicon; Switches;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microprocesses and Nanotechnology Conference, 2004. Digest of Papers. 2004 International
