DocumentCode
3453770
Title
Simulation of low-energy ion implantation process by atomistic modeling
Author
Kwon, Oh-Seob ; Seo, Ji-Hyun ; Yoo, Jae-Hyun ; Kim, Ki-Dong ; Lee, Jun-Gu ; Park, Il-Soo ; Won, Tae-young
fYear
2004
fDate
Oct. 27-29, 2004
Firstpage
148
Lastpage
149
Keywords
Annealing; Computational modeling; Impurities; Ion implantation; Kinetic theory; Monte Carlo methods; Nanoscale devices; Semiconductor process modeling; Silicon; Switches;
fLanguage
English
Publisher
ieee
Conference_Titel
Microprocesses and Nanotechnology Conference, 2004. Digest of Papers. 2004 International
Print_ISBN
4-99024720-5
Type
conf
DOI
10.1109/IMNC.2004.245767
Filename
1459517
Link To Document