مرکز منطقه ای اطلاع رساني علوم و فناوري - Dual beam lithography (FIB + EBL) for nanometric structures

DocumentCode :

3453793

Title :

Dual beam lithography (FIB + EBL) for nanometric structures

Author :

Cabrini, Stefano ; Carpentiero, Alessandro ; Businaro, Luca ; Candeloro, Patrizio ; Romanato, Filippo ; Di Fabrizio, Enzo

fYear :

2004

fDate :

Oct. 27-29, 2004

Firstpage :

150

Lastpage :

151

Keywords :

Data engineering; Electron beams; Ion beams; Lithography; Microelectronics; Milling; Nanostructures; Optical scattering; Slabs; Wires;

fLanguage :

English

Publisher :

ieee

Conference_Titel :

Microprocesses and Nanotechnology Conference, 2004. Digest of Papers. 2004 International

Print_ISBN :

4-99024720-5

Type :

conf

DOI :

10.1109/IMNC.2004.245768

Filename :

1459518

Link To Document :