Experimental and theoretical studies on Mo/Si multilayers for extreme ultraviolet lithography using picosecond ultrasonics

Author

Nen-Wen Pu ; Bokor, J.

Author_Institution

Dept. of Appl. Phys., Chung Cheng Inst. of Technol., Taoyuan, Taiwan

fYear

2001

fDate

11-11 May 2001

Firstpage

441

Lastpage

442

Abstract

Summary form only given. Mo/Si multilayer mirror coatings are a key enabling technology for extreme ultraviolet (EUV) lithography, a promising next-generation tool for the mass production of integrated circuits with design rules below 0.1 /spl mu/m. We have performed experimental and theoretical studies on the vibrational behavior of Mo/Si multilayers for EUV lithography using picosecond ultrasonics. Foundations have been laid for applying this technique in nondestructive characterization of multilayer coatings.

Keywords

X-ray lithography; high-speed optical techniques; mirrors; molybdenum; optical multilayers; optical pumping; photoacoustic effect; reflectivity; silicon; ultrasonic materials testing; ultraviolet lithography; vibrational modes; 0.1 micron; EUV lithography; Mo-Si; Mo/Si multilayer mirror coatings; Mo/Si multilayers; acoustic waves; design rules; extreme ultraviolet lithography; impulsively excited; integrated circuits; mass production; next-generation tool; nondestructive characterization; picosecond ultrasonics; pump-probe transient reflectivity technique; ultrashort pulses; vibrational behavior; Coatings; Equations; Frequency; Integrated circuit technology; Laser excitation; Lithography; Nonhomogeneous media; Optical pulses; Optical surface waves; Ultraviolet sources;

fLanguage

English

Publisher

ieee

Conference_Titel

Lasers and Electro-Optics, 2001. CLEO '01. Technical Digest. Summaries of papers presented at the Conference on

Conference_Location

Baltimore, MD, USA

Print_ISBN

1-55752-662-1

Type

conf

DOI

10.1109/CLEO.2001.948018

Filename

948018