Title :
Oxygen gas assisted electron beam lithography in organosilane self-assembled monolayers
Author :
Yamaguchi, M. ; Saito, N. ; Takai, O.
Keywords :
Atomic force microscopy; Computer science; Design engineering; Electron beams; Focusing; Ion beams; Lithography; Oxygen; Resists; Self-assembly;
Conference_Titel :
Microprocesses and Nanotechnology Conference, 2004. Digest of Papers. 2004 International
Print_ISBN :
4-99024720-5
DOI :
10.1109/IMNC.2004.245792
