• DocumentCode
    345471
  • Title

    Simulation generation and characterization of high brightness electron source at 1 GV/M gradient

  • Author

    Srinivasan-Rao, T. ; Schill, J. ; Ben-Zvi, I. ; Batchelor, K. ; Farrell, J.P. ; Smedley, J. ; Lin, X.E. ; Odian, A.

  • Author_Institution
    Brookhaven Nat. Lab., Upton, NY, USA
  • Volume
    1
  • fYear
    1999
  • fDate
    1999
  • Firstpage
    75
  • Abstract
    This paper describes computer simulations and measurements on an electron bunch from a pulsed, high gradient gap. MAFIA and PBGUNS were used to calculate the emittance, brightness and energy spread of the electron beam for peak currents ranging from 10 A to 1 k4 and pulse durations ranging from 0.3 ps to 10 ps. Under optimum conditions, a normalized emittance of 10-7 pi m-rad, a beam brightness of 3×1015 A/(m-rad)2 and an energy spread of 0.15% were obtained. A pulsed high voltage with 1 MV amplitude, and ~1 ns duration was applied to the diode with an interelectrode gap ranging from 2 mm to 0.5 mm. Cu cathodes with three different surface preparations, diamond polished, diamond cut and chemically cleaned, have been tested for their voltage hold-off properties under this high gradient and the Fowler-Nordheim plots were generated. The diamond polished OFC class II copper was shown to consistently produce lower dark current and higher hold-off voltage. Photoemission studies have been made using light from a KrF excimer. The field enhancement factor for photoemission was calculated to be 5, an order of magnitude smaller than the dark current beta for a similar surface
  • Keywords
    digital simulation; electron sources; particle beam bunching; photoemission; 0.3 to 10 ps; 1 GV/M gradient; Cu; Cu cathodes; Fowler-Nordheim plots; MAFIA; PBGUNS; brightness; computer simulation; dark current; electron bunch; emittance; energy spread; field enhancement factor; high brightness electron source; hold-off voltage; normalized emittance; photoemission; Brightness; Character generation; Computational modeling; Computer simulation; Copper; Dark current; Electrons; Photoelectricity; Pulse measurements; Voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Particle Accelerator Conference, 1999. Proceedings of the 1999
  • Conference_Location
    New York, NY
  • Print_ISBN
    0-7803-5573-3
  • Type

    conf

  • DOI
    10.1109/PAC.1999.795628
  • Filename
    795628