DocumentCode :
3454800
Title :
Fabrication of multiply-stacked structures of Si quantum-dots embedded in SiO
2
by combination of low-pressure CVD and remote plasma treatments
Author :
Makihara, Katsunori ; Nakagawa, Hiroshi ; Ikeda, Mitsuhisa ; Murakami, Hideki ; Higashi, Seiichiro ; Miyazaki, Seiichi
fYear :
2004
fDate :
Oct. 27-29, 2004
Firstpage :
216
Lastpage :
217
Keywords :
Argon; Fabrication; Hydrogen; Plasma applications; Plasma density; Plasma properties; Plasma temperature; Quantum dots; Surface charging; Surface treatment;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microprocesses and Nanotechnology Conference, 2004. Digest of Papers. 2004 International
Print_ISBN :
4-99024720-5
Type :
conf
DOI :
10.1109/IMNC.2004.245803
Filename :
1459553
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=3454800
