DocumentCode :
3454838
Title :
Nanolithography based on photocatalysis of TiO2 by an atomic force microscope
Author :
Kobayashi, Kenkichiro ; Torruta, Y. ; Maeda, Yasuluha
fYear :
2004
fDate :
Oct. 27-29, 2004
Firstpage :
218
Lastpage :
219
Keywords :
Atmospheric measurements; Atomic force microscopy; Atomic layer deposition; Nanolithography; Scanning probe microscopy; Soft lithography; Spatial resolution; Substrates; Surface topography; Voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microprocesses and Nanotechnology Conference, 2004. Digest of Papers. 2004 International
Print_ISBN :
4-99024720-5
Type :
conf
DOI :
10.1109/IMNC.2004.245804
Filename :
1459554
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=3454838
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