Title :
Chemical Controlled Dissolution of LGS Samples: Comparison with Quartz and GaPO4
Author :
Assoud, A. ; Bel, O. ; Boy, J.J. ; Leblois, T.
Author_Institution :
FEMTO-ST Inst., Besancon
fDate :
May 29 2007-June 1 2007
Abstract :
Though the use of LGS family crystals for filtering applications is now well known, we present here one of the best way to realize antimesa structures working at higher frequencies than a few tens of MHz. Generally, this kind of realizations requires dissolution depths higher than 100 mum. Consequently, the rough surface state does not remain constant: it becomes smoother or its roughness parameter can increase drastically. For that, we have compared the chemical dissolution of the crystal in four different etchants (HCl, HNO3, H3PO4 and NH4F.HF) for three crystal orientations: X-, Y-and Z-cuts (in LGS, Y-cut is similar to the AT-cut in quartz crystal). The parameters chosen to compare the efficiency of our selected solvents are the dissolution rate and the average roughness Ra. Furthermore, we have worked at 2 different temperatures: 60 and 80degC. The experiences show firstly that a X-cut plate is etched in HCl rapidly, compared to the Z-cut and so reveal the anisotropy of the material structure. Secondly, we observe that the dissolution rate of LGS in HCl solution is 8 to 10 times higher than in other solvents, at a given temperature. Unfortunately, it tends to reveal deep dissolution figures on the surface. From this set of experiments, we conclude that the best compromise is obtained with the ammonium bifluorure solvent which allows us to obtain a smoother surface state than initially.
Keywords :
crystal orientation; dissolving; gallium compounds; lanthanum compounds; piezoelectric materials; polishing; surface roughness; GaPO4; HCl solution; La3Ga5SiO14; SiO2; ammonium bifluorure solvent; chemical controlled dissolution; chemical polishing; crystal orientations; etchants; inorganic acids; langasite; material structure anisotropy; piezoelectric material; quartz crystal; surface roughness; temperature 60 degC to 80 degC; Anisotropic magnetoresistance; Chemicals; Crystals; Etching; Filtering; Frequency; Rough surfaces; Solvents; Surface roughness; Temperature;
Conference_Titel :
Frequency Control Symposium, 2007 Joint with the 21st European Frequency and Time Forum. IEEE International
Conference_Location :
Geneva
Print_ISBN :
978-1-4244-0646-3
Electronic_ISBN :
1075-6787
DOI :
10.1109/FREQ.2007.4319170