DocumentCode :
3455568
Title :
Direct modification near the interface of SiO2/Si[001] by low energy N+ ion beam irradiation
Author :
HACHIUE, Syunsuke ; Teraoka, Yuden
fYear :
2004
fDate :
Oct. 27-29, 2004
Firstpage :
272
Lastpage :
273
Keywords :
Bonding; Filters; Ion beams; Ion sources; Kinetic energy; Photoelectricity; Plasma accelerators; Plasma sources; Plasma transport processes; Synchrotron radiation;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microprocesses and Nanotechnology Conference, 2004. Digest of Papers. 2004 International
Print_ISBN :
4-99024720-5
Type :
conf
DOI :
10.1109/IMNC.2004.245647
Filename :
1459581
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=3455568
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