• DocumentCode
    3455614
  • Title

    Studies of the dependence on oxidation thermal processes of effects on the electrical properties of silicon detectors by fast neutron radiation

  • Author

    Li, Zheng ; Kraner, H.W.

  • Author_Institution
    Brookhaven Nat. Lab., Upton, NY, USA
  • fYear
    1991
  • fDate
    2-9 Nov. 1991
  • Firstpage
    239
  • Abstract
    High-resistivity silicon detectors along with MOS capacitors made on five silicon dioxides with different thermal conditions (975 degrees C to 1200 degrees C) have been exposed to fast neutron irradiation up to a fluence of a few times 10/sup 14/ n/cm/sup 2/. New measurement techniques such as capacitance-voltage (C-V) of MOS capacitors and current-voltage (I-V) of back-to-back diodes (p/sup +/-n/sup -/-p/sup +/ if n/sup -/ is not inverted to p) or resistors (p/sup +/-p-p/sup +/ if inverted) have been introduced in monitoring the possible type-inversion (n to p) under high neutron fluence. No type-inversion in the material underneath SiO/sub 2/ and the p/sup +/ contact has been observed so far for detectors made on the five oxides up to a neutron fluence of a few times 10/sup 13/ n/cm/sup 2/. However, it has been found that detectors made on higher-temperature oxides (T>or=1100 degrees C) exhibit less leakage current increase at high neutron fluence ( phi >or=10/sup 13/ n/cm/sup 2/).<>
  • Keywords
    neutron effects; oxidation; semiconductor counters; semiconductor diodes; 975 to 1200 degC; MOS capacitors; Si-SiO/sub 2/; back-to-back diodes; capacitance-voltage; current-voltage; fast neutron irradiation; leakage current; light resistivity Si detector; oxidation thermal processes; resistors; type-inversion; Capacitance-voltage characteristics; Detectors; Diodes; MOS capacitors; Measurement techniques; Monitoring; Neutrons; Oxidation; Resistors; Silicon compounds;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Nuclear Science Symposium and Medical Imaging Conference, 1991., Conference Record of the 1991 IEEE
  • Conference_Location
    Santa Fe, NM, USA
  • Print_ISBN
    0-7803-0513-2
  • Type

    conf

  • DOI
    10.1109/NSSMIC.1991.258884
  • Filename
    258884