DocumentCode :
3455626
Title :
Fabrication of silicon and germanium nanostructures by combination of hydrogen plasma dry etching and VLS growth mechanism
Author :
Yang, Ming-Che ; Shich, J. ; Ko, Tsung-Shine ; Chen, Hsuen-Li ; Chu, Tieh-Chi
fYear :
2004
fDate :
Oct. 27-29, 2004
Firstpage :
276
Lastpage :
277
Keywords :
Dry etching; Fabrication; Germanium; Gold; Hydrogen; Nanoparticles; Nanostructures; Nanowires; Plasma applications; Silicon;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microprocesses and Nanotechnology Conference, 2004. Digest of Papers. 2004 International
Print_ISBN :
4-99024720-5
Type :
conf
DOI :
10.1109/IMNC.2004.245649
Filename :
1459583
Link To Document :
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