Title :
Etching characteristics of TaN/HfO2 structure in Cl2/Ar and SF6/Cl2/Ar inductively coupled plasma
Author :
Shin, M.H. ; Na, S.W. ; Lee, N.-E. ; Kim, J.Y.
Keywords :
Argon; Coils; Control systems; Electrodes; Etching; Hafnium oxide; Plasma applications; Plasma chemistry; Plasma properties; Voltage;
Conference_Titel :
Microprocesses and Nanotechnology Conference, 2004. Digest of Papers. 2004 International
Print_ISBN :
4-99024720-5
DOI :
10.1109/IMNC.2004.245650
