مرکز منطقه ای اطلاع رساني علوم و فناوري - Composition and nanostructure of carbon/silicon graded film produced by ionization-assisted deposition

DocumentCode :

3455726

Title :

Composition and nanostructure of carbon/silicon graded film produced by ionization-assisted deposition

Author :

Mano, Tsuyoshi ; Sugiyama, Osamu ; Shibuya, Yoshio ; Nakayama, Hiroki ; Taka, Osamu

fYear :

2004

fDate :

Oct. 27-29, 2004

Firstpage :

282

Lastpage :

283

Keywords :

Acceleration; Argon; Bonding; Carbon compounds; Chemical analysis; Etching; Semiconductor films; Silicon; Substrates; Titanium alloys;

fLanguage :

English

Publisher :

ieee

Conference_Titel :

Microprocesses and Nanotechnology Conference, 2004. Digest of Papers. 2004 International

Print_ISBN :

4-99024720-5

Type :

conf

DOI :

10.1109/IMNC.2004.245652

Filename :

1459586

Link To Document :