DocumentCode :
3455849
Title :
Laser shock removal of nanoparticles from Si capping layer of EUV mask
Author :
Lee, Sang-Ho ; Kang, Young-Jae ; Park, Jin-Goo ; Busnaina, A.A. ; Lee, Jong-Myung ; Kim, Tae-Hoon
fYear :
2004
fDate :
Oct. 27-29, 2004
Firstpage :
288
Lastpage :
289
Keywords :
Chemical lasers; Cleaning; Electric shock; Fluorescence; Lithography; Nanoparticles; Optical filters; Optical microscopy; Particle measurements; Ultraviolet sources;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microprocesses and Nanotechnology Conference, 2004. Digest of Papers. 2004 International
Print_ISBN :
4-99024720-5
Type :
conf
DOI :
10.1109/IMNC.2004.245656
Filename :
1459590
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=3455849
