DocumentCode :
3455998
Title :
Nano-patterning using an embedded particle monolayer as an etch mask
Author :
Nakanishi, Tsutomu ; Hiraoka, Toru ; Fujimoto, Akira ; Asakawa, Koji
fYear :
2004
fDate :
Oct. 27-29, 2004
Firstpage :
300
Lastpage :
301
Keywords :
Etching; Gratings; Nanoscale devices; Nonhomogeneous media; Reflectivity; Research and development; Resins; Self-assembly; Silicon compounds; Substrates;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microprocesses and Nanotechnology Conference, 2004. Digest of Papers. 2004 International
Print_ISBN :
4-99024720-5
Type :
conf
DOI :
10.1109/IMNC.2004.245662
Filename :
1459596
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=3455998
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