DocumentCode
3455998
Title
Nano-patterning using an embedded particle monolayer as an etch mask
Author
Nakanishi, Tsutomu ; Hiraoka, Toru ; Fujimoto, Akira ; Asakawa, Koji
fYear
2004
fDate
Oct. 27-29, 2004
Firstpage
300
Lastpage
301
Keywords
Etching; Gratings; Nanoscale devices; Nonhomogeneous media; Reflectivity; Research and development; Resins; Self-assembly; Silicon compounds; Substrates;
fLanguage
English
Publisher
ieee
Conference_Titel
Microprocesses and Nanotechnology Conference, 2004. Digest of Papers. 2004 International
Print_ISBN
4-99024720-5
Type
conf
DOI
10.1109/IMNC.2004.245662
Filename
1459596
Link To Document