Title :
Fabrication of nanodimensional objects by atomic-force lithography methods
Author :
Vostokov, N.V. ; Volgunov, D.G. ; Dryakhlushin, V.F. ; Klimov, A.Yu. ; Rogov, V.V. ; Sukhodoev, L.V. ; Shashkin, V.I.
Author_Institution :
Inst. for Phys. of Microstruct., Acad. of Sci., Nizhny Novgorod, Russia
Abstract :
An atomic-force lithography method yielding individual elements of <100 nm size has been developed. It involves deformation of the masking layer with an atomic-force microscope probe, followed by plasma-chemical etching and deposition of metal contacts through the mask.
Keywords :
atomic force microscopy; lithography; masks; nanotechnology; sputter etching; atomic-force lithography methods; atomic-force microscope probe; masking layer; metal contact deposition; nanodimensional objects; plasma-chemical etching; Atomic force microscopy; Atomic layer deposition; Fabrication; Lithography; Physics; Plasma applications; Probes; Semiconductor films; Silicon; Substrates;
Conference_Titel :
Microwave Conference, 1999. Microwave & Telecommunication Technology. 1999 9th International Crimean [In Russian with English abstracts]
Conference_Location :
Sevastopol, Crimea, Ukraine
Print_ISBN :
966-572-003-1
DOI :
10.1109/CRMICO.1999.815128
