• DocumentCode
    3456433
  • Title

    Amorphous Ge bipolar blocking contacts on Ge detectors

  • Author

    Luke, P.N. ; Cork, C.P. ; Madden, N.W. ; Rossington, C.S. ; Wesela, M.F.

  • Author_Institution
    Lawrence Berkeley Lab., California Univ., CA, USA
  • fYear
    1991
  • fDate
    2-9 Nov. 1991
  • Firstpage
    85
  • Abstract
    The authors report on the performance of high-purity Ge radiation detectors with amorphous Ge (a-Ge) contacts fabricated using RF sputtering techniques. Electrical contacts formed using sputtered a-Ge films on high-purity Ge crystals were found to exhibit good blocking behavior in both polarities with low leakage currents. The a-Ge contacts have thin dead layers associated with them and can be used in place of lithium-diffused, ion-implanted or Schottky barrier contacts on Ge radiation detectors. Multielectrode detectors can be fabricated with very simple processing steps using these contacts.<>
  • Keywords
    amorphous semiconductors; electrical contacts; elemental semiconductors; germanium; semiconductor counters; semiconductor junctions; Ge detectors; Ge-Ge; amorphous Ge contact; bipolar blocking contacts; leakage currents; Amorphous materials; Boron; Contacts; Crystals; Fabrication; Ion implantation; Leakage current; Lithium; Radiation detectors; Schottky barriers;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Nuclear Science Symposium and Medical Imaging Conference, 1991., Conference Record of the 1991 IEEE
  • Conference_Location
    Santa Fe, NM, USA
  • Print_ISBN
    0-7803-0513-2
  • Type

    conf

  • DOI
    10.1109/NSSMIC.1991.258915
  • Filename
    258915