DocumentCode :
3456640
Title :
Fine fabrication of gainasp-inp photonic crystal by Hi/Xe ICP etching using electron beam resist mask
Author :
Fujita, Masayuki ; Sugitatsu, Atsushi ; Uesugi, Toshitsugu ; Noda, Susumu
fYear :
2004
fDate :
Oct. 27-29, 2004
Firstpage :
344
Lastpage :
345
Keywords :
Chemicals; Electron beams; Fabrication; Indium phosphide; Personal communication networks; Photonic band gap; Photonic crystals; Plasma temperature; Resists; Sputter etching;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microprocesses and Nanotechnology Conference, 2004. Digest of Papers. 2004 International
Print_ISBN :
4-99024720-5
Type :
conf
DOI :
10.1109/IMNC.2004.245637
Filename :
1459619
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=3456640
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