DocumentCode
3456640
Title
Fine fabrication of gainasp-inp photonic crystal by Hi/Xe ICP etching using electron beam resist mask
Author
Fujita, Masayuki ; Sugitatsu, Atsushi ; Uesugi, Toshitsugu ; Noda, Susumu
fYear
2004
fDate
Oct. 27-29, 2004
Firstpage
344
Lastpage
345
Keywords
Chemicals; Electron beams; Fabrication; Indium phosphide; Personal communication networks; Photonic band gap; Photonic crystals; Plasma temperature; Resists; Sputter etching;
fLanguage
English
Publisher
ieee
Conference_Titel
Microprocesses and Nanotechnology Conference, 2004. Digest of Papers. 2004 International
Print_ISBN
4-99024720-5
Type
conf
DOI
10.1109/IMNC.2004.245637
Filename
1459619
Link To Document