Infrared absorption by conical silicon microstructures made in a variety of background gases using femtosecond-laser pulses

Author

Younkin, R. ; Mazur, E. ; Carey, J.E. ; Crouch, C. ; Levinson, J.A. ; Friend, C.M.

Author_Institution

Dept. of Phys., Harvard Univ., Cambridge, MA, USA

fYear

2001

fDate

11-11 May 2001

Firstpage

556

Abstract

Summary form only given. Previous work in our group has shown that novel conical microstructures are formed on the surface of silicon when it is irradiated with 100-fs laser pulses in the presence of halogen-containing gases. Structures are also formed using other background gases, such as N/sub 2/ or air, but they tend to be more blunt and irregular in shape. We have measured the optical,properties of microstructures formed in various gases. The structures are typically 1 /spl mu/m wide at the top and several /spl mu/m wide at the base, with a height in the range 1-20 /spl mu/m, depending on ambient gas pressure, and laser fluence.

Keywords

crystal microstructure; high-speed optical techniques; infrared spectra; laser beam machining; micromachining; silicon; 1 micron; 1 to 20 micron; 100 fs; N/sub 2/; Si; ambient gas pressure; background gases; background pressure; conical silicon microstructures; femtosecond-laser pulses; fs laser pulses; gas species; halogen-containing gases; infrared absorption; laser beam machining; laser fluence; laser parameters; micromachining; microstructures; optical properties; Electromagnetic wave absorption; Gas lasers; Gases; Microstructure; Optical pulses; Optical surface waves; Shape measurement; Silicon; Sulfur hexafluoride; Ultrafast optics;

fLanguage

English

Publisher

ieee

Conference_Titel

Lasers and Electro-Optics, 2001. CLEO '01. Technical Digest. Summaries of papers presented at the Conference on

Conference_Location

Baltimore, MD, USA

Print_ISBN

1-55752-662-1

Type

conf

DOI

10.1109/CLEO.2001.948160

Filename

948160